De-Hibit 200

Product Number:

CAS #

CAS #                 Product #

    24013
    9003-70-7

Size

Price

$131.84

Quantity

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Product Specifications
Safety Data Sheet (SDS)
Handling
    Exercise normal care
Storage
    Store at room temperature
Hazards
    Irritant
Hazard Code
    H2g
Related Documents
Related Documents

    No References

De - Hibit 200 - Polysciences
De - Hibit 200 - Polysciences

Product Description

De-Hibit-200 macroreticular ion exchange resin is supplied as water-saturated chloride beads. For use with non-aqueous monomers, it is first washed with dilute sodium chloride to remove any free amine form. This is done by passing 4 column volumes of dilute NaCl (approximately 4% by weight) through the wet resin. The column is then rinsed with distilled or deionized water. The water must then be removed by passing methanol equal to 2.5 times the resin volume and allowing it to flow through the resin column in one hour. If other solvents are to be used, they are then used following the methanol. The same amount and flow times are used. For removal of MEHQ, hydroquinone, or t-butyl catechol, the monomer is passed downflow through the column at a rate of about four bed volumes per hour. With a monomer containing 100 ppm of inhibitor approximately 170 bed volumes may be passed through before there is leakage of inhibitor. The De-Hibit-200 resin may be regenerated by passing 2.5 bed volumes of methanol upward through the resin in 1 hour to remove the inhibitor. Regeneration by backflow through the column is more efficient than downflow. For use with aqueous monomers, the resin is also back washed with two bed volumes of water. For water soluble monomers such as glycol methacrylate, there is no need to condition the ion-exchange resin beyond the methanol treatment. The efficiency of inhibitor removed depends on the concentration of inhibitor and the rate of monomer feed. Efficiency is greatest for higher concentrations of inhibitor. Levels of inhibitor below 1ppm can be easily obtained. Hydroquinone (HQ) is more easily removed than methyl ether of hydroquinone (MEHQ). The resin may be regenerated repeatedly over a period of years without loss of efficiency. Resin for removal of phenolic inhibitors (hydroquinone monomethyl ether or t-butylcatechol) from neutral monomers, e.g., acrylate esters or styrene derivatives.
Suitable for use with Inhibitor Removal Column, Cat. #19708
De - Hibit 200 - Polysciences
De - Hibit 200 - Polysciences
Product Specifications
Safety Data Sheet (SDS)
Handling
    Exercise normal care
Storage
    Store at room temperature
Hazards
    Irritant
Hazard Code
    H2g
Related Documents
References

    No References